一、个人基本情况

何艳，女，副教授，博士。

二、学习、工作经历

三、学术兼职

辽宁石油化工大学学报青年编委

四、研究方向

精密加工与特种加工、半导体材料的高效加工技术、机械部件的摩擦学和磨损分析、纳米制造

五、研究生招生专业

机械工程等相关专业

六、主要业绩

无

七、近期主持的主要科研项目

1、辽宁省博士科研启动基金计划项目“超声振动-光催化复合辅助抛光碳化硅晶体机理及损伤研究（编号. 2022-BS-292）”（主持）

2、辽宁省教育厅科学技术研究项目“电助光催化抛光单晶碳化硅机理及损伤研究(编号. LJKZ0383）”（主持）

3、辽宁石油化工大学引进人才科研启动基金“光催化辅助抛光单晶碳化硅技术与机理（编号. 2020XJJL-012）”（主持）

八、代表作

[1] Yan He, Zikai Gao, Meiling Tang, et al. Characteristics of atomic removal and mechanism of damage formation in vibration-assisted nano cutting of copper-nickel alloy[J]. Materials Today Communications, 2024, 38: 107668. （SCI：001133493000001）

[2] Yan He, Zikai Gao, Meiling Tang, et al. Study on the atomic removal behavior and damage formation mechanism of nano cutting copper–nickel alloy with diamond tool [J]. Modelling and Simulation in Materials, 2024, 32(3): 32(3): 035011. （SCI：001163603200001）

[3] Yan He, Wenzhi Tang, Peng Gao, et al. Nano-polishing characteristics in vibration-assisted CMP of single-crystal silicon carbide via molecular dynamics simulations[J]. Materials Science in Semiconductor Processing, 2023, 164: 107637. (SCI 检索号：001014715300001）

[4] Yan He, Jingting Sun, Peng Gao, et al. Atomic removal mechanism of nano polishing for single-crystal AlN substrate via molecular dynamics[J]. Materials Science in Semiconductor Processing, 2023, 156: 107294. (SCI 检索号：000918309200001)

[5] Yan He, Meiling Tang, Lin Fan, et al. Investigation of the atomistic behavior in nanofinishing single-crystal aluminium nitride with hydroxyl radical •OH environment[J]. Computational Materials Science, 2022, 214: 111770. (SCI 检索号：000632795800002)

[6] Yan He, Zewei Yuan, Meiling Tang, et al. Mechanism of chemical and mechanical mutual promotion in photocatalysis-assisted chemical mechanical polishing for single-crystal SiC[J]. Proceedings of the Institution of Mechanical Engineers, Part C: Journal of Mechanical Engineering Science, 2022, 236(24): 11464-11478.(SCI 检索号：000840244700001)

[7] Yan He, Zewei Yuan, Shuyuan Song, et al. Investigation on Material Removal Mechanisms in Photocatalysis-Assisted Chemical Mechanical Polishing of 4H-SiC Wafers[J]. International Journal of Precision Engineering and Manufacturing, 2021, 22(5): 951-963. (SCI 检索号：000632795800002)

[8] Yan He, Zewei Yuan, Kai Cheng, et al. Development of Electrical Enhanced Photocatalysis Polishing Slurry for Silicon Carbide Wafer[J]. Proceedings of the Institution of Mechanical Engineers, Part J: Journal of Engineering Tribology, 2020, 234(3): 401-413. (SCI 检索号：000483297100001)

[9] Gao Xingjun, Li Xiang, He Yan*, et al. Investigation on Electrical Enhanced Photocatalysis Polishing of Single-Crystal Silicon Carbide Substrates[J]. International Journal of Precision Engineering and Manufacturing, 2022, 23(11): 1261-1274. (SCI 检索号：000853473300002)

[10] Fan Lin, Deng Zilong, He Yan*, et al. The effects of micro-texture shape on serrated chip geometry in the hardened steel AISI D2 cutting process[J]. Surface Topography-Metrology And Properties, 2022, 10(1): 015031. (SCI 检索号：000765957800001)

[11] 何艳，苑泽伟，段振云，等．单晶碳化硅晶片高效超精密抛光工艺[J]．哈尔滨工业大学学报，2019，51（1）：115-121．（EI 检索号：20191306701036）

[12] 何艳，苑泽伟，段振云，等．单晶SiC的电助光催化抛光及去除机理研究[J]．中国机械工程，2020，31（4）：403-409．（EI 检索号：21449769）

[13] Zewei Yuan, Yan He, Quan Wen, et al. Environment-Friendly Chemical Mechanical Polishing Slurry for SiC Wafer[J]. Materials Science Forum. 2016, 874: 415-419. (EI 检索号：20164302933068)

[14] 何艳，李翔，高兴军，等. 基于Python语言的超薄金刚石切割片建模与SiC晶片切割仿真[J].金刚石与磨料磨具工程，2023，43(05)：621-631.

[15] 王一凡，唐文智，何 艳，等. 金刚石磨粒纳米加工单晶碳化硅非连续表面机理研究[J].金刚石与磨料磨具工程，2024，44(01)：1-9.

[16] 何艳，苑泽伟，王坤，等．基于金刚石微粉的单晶蓝宝石CMP工艺研究[J]．机械设计与制造，2017，(S1)：95-97+101

[1] 何艳，苑泽伟，王坤，等．单晶蓝宝石高效超精密加工技术研究[J]．组合机床与自动化加工技术，2018，(02)：136-139．

[2] 苑泽伟，何艳，郑鹏，等．利用光催化氧化作用精密可控切割石墨烯带的方法与装置. 国家发明专利，专利号：ZL201710293060.0，2019.1授权．

[17] Zewei Yuan, Yan He, Zhuji Jin, et al. Prediction of the Interface Temperature Rise in Tribochemical Polishing of CVD Diamond[J]. Chinese Journal of Mechanical Engineering, 2017, 30(2): 310-320. (SCI 检索号：000399019800010)

[18] Zewei Yuan, Yan He, Xingwei Sun, et al. UV-TiO₂ photocatalysis-assisted chemical mechanical polishing 4H-SiC wafer[J]. Materials & Manufacturing Processes, 2018, 33(11): 1214-1222. (SCI 检索号：000430424000009)

[19] Zewei Yuan, Yan He, Kai Cheng, et al. Effect of Self-developed Graphene Lubricant on Tribological Behaviour of Silicon carbide/Silicon nitride interface[J]. Ceramics international, 2019, 45: 1011-1022. (SCI 检索号：000465058500067)

[20] Zewei Yuan, Kai Cheng, Yan He, et al. Investigation on smoothing silicon carbide wafer with a combined method of mechanical lapping and photocatalysis assisted chemical mechanical polishing[C]. ASME 2018 13th International Manufacturing Science and Engineering Conference, 2018, 4. (SCI 检索号：000451241400002).

[21] Shuyu Guo, Lin Fan, Yan He, et al. The influence of microtexture tools on the geometric morphology of serrated chips based on stress triaxiality[J]. Industrial Lubrication and Tribology, 2023: 708677. (SCI 检索号：000451241400002).

[22] Meiling Tang, Zewei Yuan, Yan He, et al. Cooperative roles of mechanical behavior and chemical reactions in mechanical chemical nano cutting of graphene assisted by ·OH radicals: quantum mechanics and reaction molecular dynamics simulations[J]. Physica Scripta, 2023, 99(1): 015405. (SCI 检索号：001127895300001).

九、联系方式

联系电话：15909835060

E-mail: 1422017226@qq.com